Corning Unveils EXTREME ULE® Glass to Enable Next Generation of Microchips
30 Septiembre 2024 - 7:15AM
Business Wire
Corning® EXTREME ULE® Glass will help
semiconductor industry leaders mass-produce leading-edge chips
vital to advanced artificial intelligence technologies.
Corning Incorporated (NYSE: GLW), one of the world’s leading
innovators in glass, ceramic, and materials science, today unveiled
Corning® EXTREME ULE® Glass, a next-generation material that will
support chip manufacturers in meeting the rapidly growing demand
for advanced and intelligent technologies. The new material will
help chipmakers improve photomasks – the stencils for chip design –
which are critical for the mass production of today’s most advanced
and cost-efficient microchips.
Corning designed EXTREME ULE® Glass to withstand the highest
intensity extreme ultraviolet (EUV) lithography, including high
numerical aperture (High NA) EUV, which is rapidly becoming an
industry standard. EUV lithography allows manufacturers to use the
most advanced photomasks to pattern and print the smallest, most
complex chip designs. This process requires extreme thermal
stability and a uniform glass material to help ensure consistent
manufacturing performance.
“As the demands of integrated chipmaking grow with the rise of
artificial intelligence, glass innovation is more important than
ever,” said Claude Echahamian, Vice President & General
Manager, Corning Advanced Optics. “EXTREME ULE® Glass will expand
Corning’s vital role in the ongoing pursuit of Moore’s Law by
helping enable higher-powered EUV manufacturing as well as higher
yield.”
The thermal expansion qualities of EXTREME ULE® Glass help
deliver remarkable consistency and performance across all
photomasks. In addition, the glass’s exceptional flatness and
uniformity significantly reduces photomask waviness, helping limit
unwanted variability for manufacturers and allowing for the
application of advanced coatings.
EXTREME ULE® Glass marks an evolution in Corning’s portfolio of
ULE® (Ultra-Low Expansion) glass, a titania-silicate glass material
with near-zero expansion characteristics long used for EUV
photomasks and lithography mirrors. By using its innovative
glass-forming process, Corning expects to reduce both the energy
used and waste generated in production, helping to contribute to
Corning’s commitment to sustainability.
Corning will present EXTREME ULE® Glass and other innovative
semiconductor materials at SPIE Photomask Technology + Extreme
Ultraviolet Lithography conference in Monterey, California, on
Sept. 30 - Oct. 3.
For more information on Corning’s latest semiconductor
manufacturing innovations, visit
www.corning.com/advanced-optics.
About Corning Incorporated Corning (www.corning.com) is
one of the world’s leading innovators in materials science, with a
170-year track record of life-changing inventions. Corning applies
its unparalleled expertise in glass science, ceramic science, and
optical physics along with its deep manufacturing and engineering
capabilities to develop category-defining products that transform
industries and enhance people’s lives. Corning succeeds through
sustained investment in RD&E, a unique combination of material
and process innovation, and deep, trust-based relationships with
customers who are global leaders in their industries. Corning’s
capabilities are versatile and synergistic, which allows the
company to evolve to meet changing market needs, while also helping
our customers capture new opportunities in dynamic industries.
Today, Corning’s markets include optical communications, mobile
consumer electronics, display, automotive, solar, semiconductors,
and life sciences.
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version on businesswire.com: https://www.businesswire.com/news/home/20240929815986/en/
Media Relations: Jamie Post (607) 974-4843
PostJl@corning.com
Investor Relations: Ann H.S. Nicholson (607) 974-6716
NicholsoAs@corning.com
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